Cleaning & Surface Preparation: Technologies and Markets, 2010—2014
Effective cleaning has been pivotal to the evolution of the semiconductor industry over the past 40 years. Improvements in materials for removing contaminants and residues from earlier process steps have led to higher yields and enabled new integration schemes.
In 2010, the market for advanced cleaners and post etch residue removal products will reach over $1,750 million. Many companies are competing in this area and the requirement for novel technologies offer opportunities to new entrants; all require a greater understanding of the market and technology trends.
Total Clean Operations
Report Contents
1. Executive Summary
- 2010—2014 Consumption of materials
- Growth rates by cleaning technology
- Regional distribution of depositions
2. Methodology and Background
3. Forecast Drivers
- Segmentation by device type
- Review ITRS
- Map unit operations by device type
4. Technology Evolution
- FEOL Critical Cleans
- Passivation of Ge Surfaces
- Low Surface Tension Chemicals
- Hose Dose Implant Strip
- High Selectivity Etch
- Cu/LKD Strip and Clean
- PCMP
- Wafer Bonding
5. Forecasts
- By Application and node
- 2010—2014
6. Supplier Analysis
- Supplier share by application
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