Linx Conferences

Linx Conferences

As the premiere electronic materials consultant to the semiconductor industry, Linx is involved in many semiconductor industry events, including the Strategic Materials Conference in Half Moon Bay and CMPG Users Group at Semicon West. In 2015, Linx began managing the Surface Preparation and Cleaning Conference (SPCC) when Sematech stopped supporting the conference in 2015. Linx continued to manage SPCC in 2016 and 2017, expanding the conference to include the Post CMP Cleaning Conference in 2017.

Linx Conferences, a new division of Linx Consulting, was established in 2017 to manage technical conferences focused on electronic materials technology. In 2018, Linx Conferences launched Linx Cleaning Conferences, which included the SPCC as well as a new conference entitled the Business of Cleans. The Business of Cleans focuses on the business side of the cleaning business and complements the technical aspects of the business.

We look forward to seeing you in Portland for Business of Cleans Conference on April 1 and SPCC on April 2-3. We regret to inform you that The Nines no longer has rooms available but the following hotels are all within walking distance and we encourage you to reach out to them directly. The imbedded links will take you directly to their websites.

Linx Cleaning Conferences

Linx Cleaning Conferences, established in 2018, cover all aspects of the surface preparation and cleaning  business in two parts:

  • Surface Preparation and Cleaning Conference (SPCC) — The SPCC has been at the forefront of surface preparation and cleaning technology for over 20 years. Started by Sematech in 1998, Linx Consulting partnered with the SPCC Technical committee to manage the business end of the conference in 2016. The conference has thrived under Linx management and continues to grow.
  • The Business of Cleans — The Business of Cleans covers the business end of the cleaning business. Started in 2018, this conference was well-received as a complement to the SPCC and will continue as an integral part of Linx Cleaning Conferences.

Linx Cleaning Conferences 2019

Linx Cleaning Conference 2019 Details

Important Dates
  • Registration opens: January 2019

AGENDA – Conferences 2019
Monday 01-April, 2019 - Location: Design & Fashion
7:30 AM Business of Cleans Registration
7:30 AM Breakfast
8:45 AM Introductions, Welcome, Conference Overview Organizers
9:00 AM Economy & Market Duncan Meldrum Hilltop Economics
9:30 AM Economy & Market Mike Corbett Linx Consulting
10:00 AM Technology Trends Kathleen Fiehrer Intel
10:30 AM Break
11:00 AM Technology Trends Nabil Mistkawi Samsung
11:30 AM OEM Point of View Katerina Mikhaylichenko Applied Materials
12:00 PM Lunch
1:30 PM Contamination control Ted Caramberis PALL
2:00 PM Key Materials Yongqiang Lu Sachem
2:30 PM Key Materials Tianniu Rick Chen Versum Materials
3:00 PM Key Materials Mike White Entegris
3:30 PM Break
3:45 PM Key Materials Andreas Klipp BASF
4:15 PM Development of Advanced Cobalt CMP Consumables Murali Theivanayaham DOW
4:45 PM Technology Trends Kevin Ryan GLOBALFOUNDIRES
5:15 PM Business of Cleans Conference Ends
2:00-5:00 PM SPCC Pre-Registration
5:30-7:30 PM Network Reception - Yard House, 888 SW 5th Ave
Tuesday 02-April, 2019 - Location: Design & Fashion
7:30 AM Breakfast
7:30 AM - on SPCC Registration
9:00 AM Introductions,  Day 1 Welcome, Conference Overview Mark Thirsk Joel Barnett
9:20 AM Keynote: Semiconductor Process Challenges for Quantum Computing Ravi Pillarisetty Intel
9:55 AM Cobalt pre-metallization clean and functional water rinse in BEOL interconnect Els Kesters imec
10:15 AM Functional water solutions to enable wet cleaning process Hideaki Iino Kurita
10:35 AM Break
11:00 AM Controlled cobalt recess for advanced interconnect metallization Antoine Pacco imec
11:20 AM Development of Metal Free Wet Etching Chemical for Ruthenium Interconnect Takuya Ohashi TOK
11:40 AM Wet etching of Ruthenium: effect of thermal annealing Quoc Toan Le imec
12:00 PM Interfacial Layer (IL) Engineering to Extend Scalability of High-k Metal Gate for Si CMOS Devices Shariq Siddiqui GLOBALFOUNDRIES
12:20 PM Lunch
1:45 PM Invited: Cleaning Challenges associated with Scaling Boosters and New Device Architectures Oniki Yusuke imec
2:15 PM Development of Selective SiGe Etchants Glenn Westwood Avantor
2:35 PM Thermal Atomic Layer Etching of Silicon Using an Oxidation and “Conversion-Etch” Mechanism Steve George University of Colorado
2:55 PM Si trim applications: benefits and challenges Subhadeep Kal Tokyo Electron
3:15 PM Break
3:35 PM Phenomena affecting the rate and equilibrium of aqueous chemical reactions in nanochannels Guy Vereecke imec
3:55 PM Improving cleaning for advanced packaging Simon Braun imec
4:15 PM Effect of bubble on particle agglomeration in W CMP slurry Jin-Goo Park Hanyang University
4:35 PM Optimization of the removal of wafer backside ESC defects arising from ion implantation by scrubber processing with acidic chemical David Kirkwood Axcelis
4:55 PM Pause
5:00 PM Panel Discussion Moderator: Mike Corbett Linx Consulting
6:15 PM Wrap Up/Additional Questions/Adjourn Organizers
6:30 PM Networking Reception/Poster Session Mark Thirsk Joel Barnett
Day 1 SPCC End
Wednesday 03-April, 2019 - Location: Design & Fashion
7:30 AM Breakfast
9:15 AM Day 2 Welcome Organizers
9:30 AM Invited: Litho Jeff Smith Tokyo Electon
10:00 AM Oxide Regrowth Mechanism during Silicon Nitride Etching in Vertical 3D NAND Structure Sangwoo Lim Yonsei Univ
10:20 AM Phosphoric acid rinse impact on CMOS devices Philippe Garnier STM
10:40 AM Hybrid DHF and N2 Jet Spray Cleaning for Silicon Nitride and Metal Layer Kook Hyun An Hanyang University
11:00 AM Break
11:25 AM Invited:  Python based data analysis for Time of Flight Secondary ion mass spectrometer data Sean Stuart Aerospace
11:55 AM Optimization of Single Nanoparticle ICP-MS Analysis for Controlling Nanoparticles in Process Chemicals Lisa Mey-Ami Air Liquide
12:15 PM Universal surface enhanced Raman spectroscopy Ali Altun UNISERS
12:35 PM Lunch
2:00 PM Invited: A Slower Global Economy - But Watching Out for Recession Duncan Meldrum Hilltop Economics
2:25 PM Particle adsorption model on silicon wafer for clarifying required ultrapure water quality Yoichi Tanaka Kurita
2:45 PM Monitoring and Remediation of Contaminants in Bulk Chemical Eugene Shalyt ECI
3:05 PM New Methods To Reduce Variation In Bare Wafer Particle Inspection Results Harvey Tang Entegris
3:25 PM Contamination Kinetics Of Airborne Ammonia On Chromium-Coated Wafer In Cleanroom Conditions Minh-Phuong Tran CEA-Leti
3:45 PM Wrap Up/Additional Questions/Adjourn Organizers
3:55 PM Day 2 SPCC End
Improvement in post-Chemical Mechanical Planarization cleaning process for Ru interconnects Ken Harada imec
The Effects of Reductant on the Cleaning Performance for Ceria slurries with Post CMP cleaning Areji Takanaka Kanto
Novel method to characterize the retention of polydisperse particles by advanced membranes Suwen Liu Entegris
TiN Hardmask Wet Etching and Post Etch Residue Removal in BEoL Andreas Klipp BASF
Development of Wet-etch Chemistries for Selective Silicon Nitride Removal in 3D NAND Structure Jhih-Kuei Ge Versum
Understanding Interfacial Surface Interactions: Dielectric Wafer – Slurry Particles, Defectivity Improvements and Current Challenges for Low pH W-Post CMP Cleaning Formulations Daniela White Entegris
Post-Etch Residue Removal for Cobalt Contact and Interconnect Paul Bernatis Dupont
Development of Monitoring Technique for High Temperature  Phosphoric Acid by Spectroscopy Yutaro Tsuchisaka Horiba
TiN/High-K Dielectric Selective Etching for Work Function Metal removal with dielectric compatibility Wei-Shao.Tung Dupont
Chemically Controlled Megasonic Cleaning Technology for Higher PRE and Lower Pattern Damage Bongkyun Kang BASF
Study on Wet Etching of Dummy Poly-Si Dongjoo Shin SKKU
Optimization of Water Polishing for an Improved Abrasive Removal Seokjun Hong SKKU
Removal of Nano Particles on the Hard Mask Wafer Backside using Brush Cleaning Hyun-Tae Kim Hanyang Univ
Surface Analysis for EUV Lithography Process Outgassing Studies Xiaoyu Zou Air Liquide
Post-CMP W Cleaners with Excellent Tungsten Residues and Titanium Residues Removal Shih-Hsun Lin Dupont
Elimination of Surface Particles with Lobe Signature by Optimizing Post-Ash Cleans Dhiman Bhattacharyya GLOBALFOUNDRIES
Wet Etchant for DRAM Word line Titanium Nitride Recess with Selectivity to Tungsten Paul Bernatis Dupont
Humidity Control in a FOUP by Laminar Air Curtain (LAC) When FOUP Door is in Open Condition Shih-Cheng Hu NTUT
Investigation of Ceria Abrasive Removal during Post Chemical Mechanical Polishing Cleaning Juhwan Kim SKKU
Aluminum Nitride Removal Formulation with Isotropic Silicon Etching Property Chung-Yi Chang Versum
Material Solution toward Efficient Polysilicon post-CMP Clean Jhih-Fong Lin Dupont
Advances of Oxide PCMP Clean Process: A Total Solution toward Superior Defect Performance Jhih-Fong Lin Dupont
Approach toward enhanced cerium residue control on post-CMP cleaned surface Jhih-Fong Lin Dupont

Linx Conferences Technical Archive

Linx Conferences Team

Mark Thirsk, Conference Director
Audrey Parton, Logistics Manager
Mike Corbett, Conference Chairman, Business of Cleans